APA (7th ed.) Citation

Ichimura, S., Hirata, M., Tanino, H., Atoda, N., Ono, M., & Hoh, K. (1983). Direct engraving on positive resists by synchrotron radiation. Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena, 1(4), 1076. https://doi.org/10.1116/1.582636

Chicago Style (17th ed.) Citation

Ichimura, S., M. Hirata, H. Tanino, N. Atoda, M. Ono, and K. Hoh. "Direct Engraving on Positive Resists by Synchrotron Radiation." Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena 1, no. 4 (1983): 1076. https://doi.org/10.1116/1.582636.

MLA (9th ed.) Citation

Ichimura, S., et al. "Direct Engraving on Positive Resists by Synchrotron Radiation." Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena, vol. 1, no. 4, 1983, p. 1076, https://doi.org/10.1116/1.582636.