Proposals and experiments on large area exposure in synchrotron radiation lithography.

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Bibliographic Details
Title: Proposals and experiments on large area exposure in synchrotron radiation lithography.
Authors: Tanino, H.1, Hoh, K.1, Hirata, M.1, Atoda, N.1, Ichimura, S.1
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 1, p232-236, 5p
Database: Applied Science & Technology Source
Description
ISSN:0734211X
DOI:10.1116/1.583234