Proposals and experiments on large area exposure in synchrotron radiation lithography.
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| Title: | Proposals and experiments on large area exposure in synchrotron radiation lithography. |
|---|---|
| Authors: | Tanino, H.1, Hoh, K.1, Hirata, M.1, Atoda, N.1, Ichimura, S.1 |
| Source: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 1, p232-236, 5p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 74324431 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Proposals and experiments on large area exposure in synchrotron radiation lithography. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Tanino%2C+H%2E%22">Tanino, H.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hoh%2C+K%2E%22">Hoh, K.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hirata%2C+M%2E%22">Hirata, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Atoda%2C+N%2E%22">Atoda, N.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Ichimura%2C+S%2E%22">Ichimura, S.</searchLink><relatesTo>1</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Microelectronics+Processing+%26+Phenomena%22">Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena</searchLink>; 1985, Vol. 3 Issue 1, p232-236, 5p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=74324431 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1116/1.583234 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 5 StartPage: 232 Titles: – TitleFull: Proposals and experiments on large area exposure in synchrotron radiation lithography. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Tanino, H. – PersonEntity: Name: NameFull: Hoh, K. – PersonEntity: Name: NameFull: Hirata, M. – PersonEntity: Name: NameFull: Atoda, N. – PersonEntity: Name: NameFull: Ichimura, S. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 01 Text: 1985 Type: published Y: 1985 Identifiers: – Type: issn-print Value: 0734211X Numbering: – Type: volume Value: 3 – Type: issue Value: 1 Titles: – TitleFull: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena Type: main |
| ResultId | 1 |