Proposals and experiments on large area exposure in synchrotron radiation lithography.

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Title: Proposals and experiments on large area exposure in synchrotron radiation lithography.
Authors: Tanino, H.1, Hoh, K.1, Hirata, M.1, Atoda, N.1, Ichimura, S.1
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 1, p232-236, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 74324431
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Proposals and experiments on large area exposure in synchrotron radiation lithography.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Tanino%2C+H%2E%22">Tanino, H.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hoh%2C+K%2E%22">Hoh, K.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hirata%2C+M%2E%22">Hirata, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Atoda%2C+N%2E%22">Atoda, N.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Ichimura%2C+S%2E%22">Ichimura, S.</searchLink><relatesTo>1</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Microelectronics+Processing+%26+Phenomena%22">Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena</searchLink>; 1985, Vol. 3 Issue 1, p232-236, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=74324431
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/1.583234
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 5
        StartPage: 232
    Titles:
      – TitleFull: Proposals and experiments on large area exposure in synchrotron radiation lithography.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Tanino, H.
      – PersonEntity:
          Name:
            NameFull: Hoh, K.
      – PersonEntity:
          Name:
            NameFull: Hirata, M.
      – PersonEntity:
          Name:
            NameFull: Atoda, N.
      – PersonEntity:
          Name:
            NameFull: Ichimura, S.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 01
              Text: 1985
              Type: published
              Y: 1985
          Identifiers:
            – Type: issn-print
              Value: 0734211X
          Numbering:
            – Type: volume
              Value: 3
            – Type: issue
              Value: 1
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
              Type: main
ResultId 1