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Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process.

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Bibliographic Details
Title:	Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process.
Authors:	Zhu, Chao-yi^1,2 (AUTHOR), Peng, Song-ang^1,2 (AUTHOR), Zhang, Xiao-rui^1,2 (AUTHOR), Yao, Yao^1,3 (AUTHOR), Huang, Xin-nan^1,2 (AUTHOR), Yan, Yun-peng^1,2 (AUTHOR), Zhang, Da-yong¹ (AUTHOR), Shi, Jing-yuan¹ (AUTHOR), Jin, Zhi^1,4 (AUTHOR) jinzhi@ime.ac.cn
Source:	Nanotechnology. 7/30/2021, Vol. 32 Issue 31, p1-9. 9p.
Database:	Academic Search Ultimate

Description
ISSN:	09574484
DOI:	10.1088/1361-6528/abfa56