APA (7th ed.) Citation

Zhu, C., Peng, S., Zhang, X., Yao, Y., Huang, X., Yan, Y., . . . Jin, Z. (2021). Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process. Nanotechnology, 32(31), 1. https://doi.org/10.1088/1361-6528/abfa56

Chicago Style (17th ed.) Citation

Zhu, Chao-yi, Song-ang Peng, Xiao-rui Zhang, Yao Yao, Xin-nan Huang, Yun-peng Yan, Da-yong Zhang, Jing-yuan Shi, and Zhi Jin. "Reducing Metal/graphene Contact Resistance via N, N-dimethylacetamide-assisted Clean Fabrication Process." Nanotechnology 32, no. 31 (2021): 1. https://doi.org/10.1088/1361-6528/abfa56.

MLA (9th ed.) Citation

Zhu, Chao-yi, et al. "Reducing Metal/graphene Contact Resistance via N, N-dimethylacetamide-assisted Clean Fabrication Process." Nanotechnology, vol. 32, no. 31, 2021, p. 1, https://doi.org/10.1088/1361-6528/abfa56.