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Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process.

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Bibliographic Details
Title: Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process.
Authors: Zhu, Chao-yi1,2 (AUTHOR), Peng, Song-ang1,2 (AUTHOR), Zhang, Xiao-rui1,2 (AUTHOR), Yao, Yao1,3 (AUTHOR), Huang, Xin-nan1,2 (AUTHOR), Yan, Yun-peng1,2 (AUTHOR), Zhang, Da-yong1 (AUTHOR), Shi, Jing-yuan1 (AUTHOR), Jin, Zhi1,4 (AUTHOR) jinzhi@ime.ac.cn
Source: Nanotechnology. 7/30/2021, Vol. 32 Issue 31, p1-9. 9p.
Database: Academic Search Ultimate
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