Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition.

Saved in:
Bibliographic Details
Title: Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition.
Authors: Takakura, Ryo1 (AUTHOR), Murakami, Seigo1 (AUTHOR), Watanabe, Kaname1 (AUTHOR), Takigawa, Ryo1 (AUTHOR) takigawa@ed.kyushu-u.ac.jp
Source: Scientific Reports. 3/3/2023, Vol. 13 Issue 1, p1-7. 7p.
Database: Academic Search Ultimate
Full text is not displayed to guests.
Description
ISSN:20452322
DOI:10.1038/s41598-023-30376-7