APA (7th ed.) Citation

Takakura, R., Murakami, S., Watanabe, K., & Takigawa, R. (2023). Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition. Scientific Reports, 13(1), 1. https://doi.org/10.1038/s41598-023-30376-7

Chicago Style (17th ed.) Citation

Takakura, Ryo, Seigo Murakami, Kaname Watanabe, and Ryo Takigawa. "Room-temperature Bonding of Al2O3 Thin Films Deposited using Atomic Layer Deposition." Scientific Reports 13, no. 1 (2023): 1. https://doi.org/10.1038/s41598-023-30376-7.

MLA (9th ed.) Citation

Takakura, Ryo, et al. "Room-temperature Bonding of Al2O3 Thin Films Deposited using Atomic Layer Deposition." Scientific Reports, vol. 13, no. 1, 2023, p. 1, https://doi.org/10.1038/s41598-023-30376-7.