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Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition.

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Title: Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition.
Authors: Takakura, Ryo1 (AUTHOR), Murakami, Seigo1 (AUTHOR), Watanabe, Kaname1 (AUTHOR), Takigawa, Ryo1 (AUTHOR) takigawa@ed.kyushu-u.ac.jp
Source: Scientific Reports. 3/3/2023, Vol. 13 Issue 1, p1-7. 7p.
Database: Academic Search Ultimate
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  Data: Room-temperature bonding of Al<subscript>2</subscript>O<subscript>3</subscript> thin films deposited using atomic layer deposition.
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  Data: <searchLink fieldCode="AR" term="%22Takakura%2C+Ryo%22">Takakura, Ryo</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Murakami%2C+Seigo%22">Murakami, Seigo</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Watanabe%2C+Kaname%22">Watanabe, Kaname</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Takigawa%2C+Ryo%22">Takigawa, Ryo</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> takigawa@ed.kyushu-u.ac.jp</i>
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  Data: <searchLink fieldCode="JN" term="%22Scientific+Reports%22">Scientific Reports</searchLink>. 3/3/2023, Vol. 13 Issue 1, p1-7. 7p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=162233560
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1038/s41598-023-30376-7
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      – Code: eng
        Text: English
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            NameFull: Takakura, Ryo
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            NameFull: Murakami, Seigo
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            NameFull: Watanabe, Kaname
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              Text: 3/3/2023
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              Y: 2023
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