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Passivation of grain boundary electronic activity in polycrystalline silicon thin films by heat treatment and hydrogenation.

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Bibliographic Details
Title: Passivation of grain boundary electronic activity in polycrystalline silicon thin films by heat treatment and hydrogenation.
Authors: Magramene, Alima1,2 (AUTHOR), Moumene, Mohamed3 (AUTHOR), Hadjoudja, Hani2 (AUTHOR), Zaidi, Beddiaf4 (AUTHOR), Gagui, Souheyla1 (AUTHOR), Hadjoudja, Bouzid1 (AUTHOR) b_hadjoudja@yahoo.fr, Chouial, Baghdadi1 (AUTHOR), Chibani, Allaoua1 (AUTHOR)
Source: International Journal of Advanced Manufacturing Technology. Oct2023, Vol. 128 Issue 9/10, p4331-4337. 7p.
Database: Academic Search Ultimate
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Description
ISSN:02683768
DOI:10.1007/s00170-023-12172-9