APA (7th ed.) Citation

Magramene, A., Moumene, M., Hadjoudja, H., Zaidi, B., Gagui, S., Hadjoudja, B., . . . Chibani, A. (2023). Passivation of grain boundary electronic activity in polycrystalline silicon thin films by heat treatment and hydrogenation. International Journal of Advanced Manufacturing Technology, 128(9/10), 4331. https://doi.org/10.1007/s00170-023-12172-9

Chicago Style (17th ed.) Citation

Magramene, Alima, Mohamed Moumene, Hani Hadjoudja, Beddiaf Zaidi, Souheyla Gagui, Bouzid Hadjoudja, Baghdadi Chouial, and Allaoua Chibani. "Passivation of Grain Boundary Electronic Activity in Polycrystalline Silicon Thin Films by Heat Treatment and Hydrogenation." International Journal of Advanced Manufacturing Technology 128, no. 9/10 (2023): 4331. https://doi.org/10.1007/s00170-023-12172-9.

MLA (9th ed.) Citation

Magramene, Alima, et al. "Passivation of Grain Boundary Electronic Activity in Polycrystalline Silicon Thin Films by Heat Treatment and Hydrogenation." International Journal of Advanced Manufacturing Technology, vol. 128, no. 9/10, 2023, p. 4331, https://doi.org/10.1007/s00170-023-12172-9.