Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications.

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Bibliographic Details
Title: Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications.
Authors: Hwang, Jong-Jin1 (AUTHOR) gywns7078@hanyang.ac.kr, Sim, Hyo-Jun1 (AUTHOR), Moon, Seung-Jae1 (AUTHOR) smoon@hanyang.ac.kr
Source: Sensors (14248220). Aug2024, Vol. 24 Issue 15, p5071. 11p.
Database: Academic Search Ultimate
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ISSN:14248220
DOI:10.3390/s24155071