Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications.
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| Title: | Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications. |
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| Authors: | Hwang, Jong-Jin1 (AUTHOR) gywns7078@hanyang.ac.kr, Sim, Hyo-Jun1 (AUTHOR), Moon, Seung-Jae1 (AUTHOR) smoon@hanyang.ac.kr |
| Source: | Sensors (14248220). Aug2024, Vol. 24 Issue 15, p5071. 11p. |
| Database: | Academic Search Ultimate |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 178950134 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Hwang%2C+Jong-Jin%22">Hwang, Jong-Jin</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> gywns7078@hanyang.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Sim%2C+Hyo-Jun%22">Sim, Hyo-Jun</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Moon%2C+Seung-Jae%22">Moon, Seung-Jae</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> smoon@hanyang.ac.kr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Sensors+%2814248220%29%22">Sensors (14248220)</searchLink>. Aug2024, Vol. 24 Issue 15, p5071. 11p. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=178950134 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/s24155071 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 5071 Titles: – TitleFull: Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Hwang, Jong-Jin – PersonEntity: Name: NameFull: Sim, Hyo-Jun – PersonEntity: Name: NameFull: Moon, Seung-Jae IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 08 Text: Aug2024 Type: published Y: 2024 Identifiers: – Type: issn-print Value: 14248220 Numbering: – Type: volume Value: 24 – Type: issue Value: 15 Titles: – TitleFull: Sensors (14248220) Type: main |
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