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Controllable Material Removal via Diffusion-Assisted Etching at the Atomic Scale.

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Bibliographic Details
Title: Controllable Material Removal via Diffusion-Assisted Etching at the Atomic Scale.
Authors: An, Haojie1,2 (AUTHOR), Wang, Jinshi2 (AUTHOR) jswang@tju.edu.cn, Xu, Zongwei2 (AUTHOR)
Source: Nanomanufacturing & Metrology. 9/16/2025, Vol. 8 Issue 1, p1-14. 14p.
Database: Academic Search Ultimate
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Description
ISSN:2520811X
DOI:10.1007/s41871-025-00277-6