High-k TiO2 dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.

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Bibliographic Details
Title: High-k TiO2 dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.
Authors: Nepal, Neeraj1 (AUTHOR) neeraj.nepal.civ@us.navy.mil, Downey, Brian P.1 (AUTHOR), Hardy, Matthew T.1 (AUTHOR), Meyer, David J.1 (AUTHOR), Wheeler, Virginia D.1 (AUTHOR)
Source: APL Electronic Devices. Sep2025, Vol. 1 Issue 3, p1-10. 10p.
Database: Academic Search Ultimate
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ISSN:29958423
DOI:10.1063/5.0274769