High-k TiO2 dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.

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Title: High-k TiO2 dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.
Authors: Nepal, Neeraj1 (AUTHOR) neeraj.nepal.civ@us.navy.mil, Downey, Brian P.1 (AUTHOR), Hardy, Matthew T.1 (AUTHOR), Meyer, David J.1 (AUTHOR), Wheeler, Virginia D.1 (AUTHOR)
Source: APL Electronic Devices. Sep2025, Vol. 1 Issue 3, p1-10. 10p.
Database: Academic Search Ultimate
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: High-k TiO<subscript>2</subscript> dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Nepal%2C+Neeraj%22">Nepal, Neeraj</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> neeraj.nepal.civ@us.navy.mil</i><br /><searchLink fieldCode="AR" term="%22Downey%2C+Brian+P%2E%22">Downey, Brian P.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Hardy%2C+Matthew+T%2E%22">Hardy, Matthew T.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Meyer%2C+David+J%2E%22">Meyer, David J.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wheeler%2C+Virginia+D%2E%22">Wheeler, Virginia D.</searchLink><relatesTo>1</relatesTo> (AUTHOR)
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22APL+Electronic+Devices%22">APL Electronic Devices</searchLink>. Sep2025, Vol. 1 Issue 3, p1-10. 10p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=188430402
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/5.0274769
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 10
        StartPage: 1
    Titles:
      – TitleFull: High-k TiO2 dielectric thin films by atomic layer deposition on InAlN/GaN and ScAlN/GaN heterostructures.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Nepal, Neeraj
      – PersonEntity:
          Name:
            NameFull: Downey, Brian P.
      – PersonEntity:
          Name:
            NameFull: Hardy, Matthew T.
      – PersonEntity:
          Name:
            NameFull: Meyer, David J.
      – PersonEntity:
          Name:
            NameFull: Wheeler, Virginia D.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 09
              Text: Sep2025
              Type: published
              Y: 2025
          Identifiers:
            – Type: issn-print
              Value: 29958423
          Numbering:
            – Type: volume
              Value: 1
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: APL Electronic Devices
              Type: main
ResultId 1