Improved dispersion control and gate stability in scaled RF GaN HEMTs using ALD TiN gate.

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Bibliographic Details
Title: Improved dispersion control and gate stability in scaled RF GaN HEMTs using ALD TiN gate.
Authors: Bai, Ruixin1 (AUTHOR) rbai33@wisc.edu, Seshadri, Parthasarathy1 (AUTHOR), Chen, Jiahao1 (AUTHOR), Mukhopadhyay, Swarnav1 (AUTHOR), Li, Chenglong1 (AUTHOR), Pasayat, Shubhra S.1 (AUTHOR), Gupta, Chirag1 (AUTHOR)
Source: APL Electronic Devices. Dec2025, Vol. 1 Issue 4, p1-8. 8p.
Database: Academic Search Ultimate
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ISSN:29958423
DOI:10.1063/5.0305050