Improved dispersion control and gate stability in scaled RF GaN HEMTs using ALD TiN gate.
Saved in:
| Title: | Improved dispersion control and gate stability in scaled RF GaN HEMTs using ALD TiN gate. |
|---|---|
| Authors: | Bai, Ruixin1 (AUTHOR) rbai33@wisc.edu, Seshadri, Parthasarathy1 (AUTHOR), Chen, Jiahao1 (AUTHOR), Mukhopadhyay, Swarnav1 (AUTHOR), Li, Chenglong1 (AUTHOR), Pasayat, Shubhra S.1 (AUTHOR), Gupta, Chirag1 (AUTHOR) |
| Source: | APL Electronic Devices. Dec2025, Vol. 1 Issue 4, p1-8. 8p. |
| Database: | Academic Search Ultimate |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 29958423 |
|---|---|
| DOI: | 10.1063/5.0305050 |