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Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.

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Title: Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.
Authors: Chen, Changzi1 (AUTHOR), Li, Yantao2 (AUTHOR), Ma, Donglin3 (AUTHOR), Jiang, Quanxin1 (AUTHOR), Peng, Jingjing1,2 (AUTHOR), Wang, Jianfei1,3 (AUTHOR) wangjianfeiimr@ustc.edu
Source: Materials (1996-1944). May2026, Vol. 19 Issue 9, p1710. 15p.
Database: Academic Search Ultimate
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ISSN:19961944
DOI:10.3390/ma19091710