APA (7th ed.) Citation

Liu, G. X., Shan, F. K., Lee, W. J., Lee, G. H., Kim, I. S., Shin, B. C., . . . Cho, C. R. (2006). TRANSPARENT TITANIUM DIOXIDE THIN FILM DEPOSITED BY PLASMA-ENHANCED ATOMIC LAYER DEPOSITION. Integrated Ferroelectrics, 81(1), 239. https://doi.org/10.1080/10584580600660504

Chicago Style (17th ed.) Citation

Liu, G. X., F. K. Shan, W. J. Lee, G. H. Lee, I. S. Kim, B. C. Shin, S. G. Yoon, and C. R. Cho. "TRANSPARENT TITANIUM DIOXIDE THIN FILM DEPOSITED BY PLASMA-ENHANCED ATOMIC LAYER DEPOSITION." Integrated Ferroelectrics 81, no. 1 (2006): 239. https://doi.org/10.1080/10584580600660504.

MLA (9th ed.) Citation

Liu, G. X., et al. "TRANSPARENT TITANIUM DIOXIDE THIN FILM DEPOSITED BY PLASMA-ENHANCED ATOMIC LAYER DEPOSITION." Integrated Ferroelectrics, vol. 81, no. 1, 2006, p. 239, https://doi.org/10.1080/10584580600660504.