Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching.
Saved in:
| Title: | Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF |
|---|---|
| Authors: | Kettle, J.1,2 jeffrey.kettle@manchester.ac.uk, Hoyle, R. T.2, Dimov, S.3 |
| Source: | Applied Physics A: Materials Science & Processing. Sep2009, Vol. 96 Issue 4, p819-825. 7p. 4 Graphs. |
| Database: | Academic Search Ultimate |
| ISSN: | 09478396 |
|---|---|
| DOI: | 10.1007/s00339-009-5319-7 |
