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Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching.

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Title: Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching.
Authors: Kettle, J.1,2 jeffrey.kettle@manchester.ac.uk, Hoyle, R. T.2, Dimov, S.3
Source: Applied Physics A: Materials Science & Processing. Sep2009, Vol. 96 Issue 4, p819-825. 7p. 4 Graphs.
Database: Academic Search Ultimate
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  Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. Sep2009, Vol. 96 Issue 4, p819-825. 7p. 4 Graphs.
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        Value: 10.1007/s00339-009-5319-7
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      – TitleFull: Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching.
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