APA (7th ed.) Citation

Xirouchaki, C., Moschovis, K., Chatzitheodoridis, E., Kiriakidis, G., & Morgen, P. (1998). Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering. Applied Physics A: Materials Science & Processing, 67(3), 295. https://doi.org/10.1007/s003390050774

Chicago Style (17th ed.) Citation

Xirouchaki, C., K. Moschovis, E. Chatzitheodoridis, G. Kiriakidis, and P. Morgen. "Chemical Characterization of As-deposited Microcrystalline Indium Oxide Films Prepared by Reactive Dc Magnetron Sputtering." Applied Physics A: Materials Science & Processing 67, no. 3 (1998): 295. https://doi.org/10.1007/s003390050774.

MLA (9th ed.) Citation

Xirouchaki, C., et al. "Chemical Characterization of As-deposited Microcrystalline Indium Oxide Films Prepared by Reactive Dc Magnetron Sputtering." Applied Physics A: Materials Science & Processing, vol. 67, no. 3, 1998, p. 295, https://doi.org/10.1007/s003390050774.