Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing.
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| Title: | Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing. |
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| Authors: | Morgan, A. E., Broadbent, E. K., Ritz, K. N., Sadana, D. K., Burrow, B. J. |
| Source: | Journal of Applied Physics. 7/1/1988, Vol. 64 Issue 1, p344. 10p. |
| Database: | Academic Search Ultimate |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.341434 |
