APA (7th ed.) Citation

Morgan, A. E., Broadbent, E. K., Ritz, K. N., Sadana, D. K., & Burrow, B. J. (1988). Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing. Journal of Applied Physics, 64(1), 344. https://doi.org/10.1063/1.341434

Chicago Style (17th ed.) Citation

Morgan, A. E., E. K. Broadbent, K. N. Ritz, D. K. Sadana, and B. J. Burrow. "Interactions of Thin Ti Films with Si, SiO2, Si3N4, and SiOxNy Under Rapid Thermal Annealing." Journal of Applied Physics 64, no. 1 (1988): 344. https://doi.org/10.1063/1.341434.

MLA (9th ed.) Citation

Morgan, A. E., et al. "Interactions of Thin Ti Films with Si, SiO2, Si3N4, and SiOxNy Under Rapid Thermal Annealing." Journal of Applied Physics, vol. 64, no. 1, 1988, p. 344, https://doi.org/10.1063/1.341434.