Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing.

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Title: Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing.
Authors: Morgan, A. E., Broadbent, E. K., Ritz, K. N., Sadana, D. K., Burrow, B. J.
Source: Journal of Applied Physics. 7/1/1988, Vol. 64 Issue 1, p344. 10p.
Database: Academic Search Ultimate
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DbLabel: Academic Search Ultimate
An: 7647996
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing.
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  Label: Authors
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  Data: <searchLink fieldCode="AR" term="%22Morgan%2C+A%2E+E%2E%22">Morgan, A. E.</searchLink><br /><searchLink fieldCode="AR" term="%22Broadbent%2C+E%2E+K%2E%22">Broadbent, E. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Ritz%2C+K%2E+N%2E%22">Ritz, K. N.</searchLink><br /><searchLink fieldCode="AR" term="%22Sadana%2C+D%2E+K%2E%22">Sadana, D. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Burrow%2C+B%2E+J%2E%22">Burrow, B. J.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>. 7/1/1988, Vol. 64 Issue 1, p344. 10p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=7647996
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1063/1.341434
    Languages:
      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 344
    Titles:
      – TitleFull: Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing.
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            NameFull: Morgan, A. E.
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            NameFull: Broadbent, E. K.
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            NameFull: Ritz, K. N.
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            NameFull: Sadana, D. K.
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            NameFull: Burrow, B. J.
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            – D: 01
              M: 07
              Text: 7/1/1988
              Type: published
              Y: 1988
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              Value: 64
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            – TitleFull: Journal of Applied Physics
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