Electrical quality of low-temperature (Tdep≤800 °C) epitaxial silicon: The effect of deposition temperature.
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| Title: | Electrical quality of low-temperature (Tdep≤800 °C) epitaxial silicon: The effect of deposition temperature. |
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| Authors: | Burger, W. R., Reif, R. |
| Source: | Journal of Applied Physics. 1/15/1988, Vol. 63 Issue 2, p368. 15p. |
| Database: | Academic Search Ultimate |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.340248 |
