Bibliographic Details
| Title: |
Modeling of Capillary Discharge Plasma for X-ray lasers, XUV Lithography and other Applications. |
| Authors: |
Shlyaptsev, V. N., Dunn, J., Moon, S. J., Fournier, K. B., Osterheld, A. L., Rocca, J. J., Filevich, J., Marconi, M., Jankowska, E., Hammarsten, E. C., Sakadzic, S., Rahman, A., Frati, M., Tomasel, F. G., Fornaciari, N., Buchenauer, D., Bender, H. A., Karim, S., Kanouff, M. |
| Source: |
AIP Conference Proceedings. 2002, Vol. 651 Issue 1, p416. 4p. |
| Database: |
Academic Search Ultimate |
