APA (7th ed.) Citation

Shlyaptsev, V. N., Dunn, J., Moon, S. J., Fournier, K. B., Osterheld, A. L., Rocca, J. J., . . . Kanouff, M. (2002). Modeling of Capillary Discharge Plasma for X-ray lasers, XUV Lithography and other Applications. AIP Conference Proceedings, 651(1), 416. https://doi.org/10.1063/1.1531364

Chicago Style (17th ed.) Citation

Shlyaptsev, V. N., et al. "Modeling of Capillary Discharge Plasma for X-ray Lasers, XUV Lithography and Other Applications." AIP Conference Proceedings 651, no. 1 (2002): 416. https://doi.org/10.1063/1.1531364.

MLA (9th ed.) Citation

Shlyaptsev, V. N., et al. "Modeling of Capillary Discharge Plasma for X-ray Lasers, XUV Lithography and Other Applications." AIP Conference Proceedings, vol. 651, no. 1, 2002, p. 416, https://doi.org/10.1063/1.1531364.