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Modeling of Capillary Discharge Plasma for X-ray lasers, XUV Lithography and other Applications.

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Title: Modeling of Capillary Discharge Plasma for X-ray lasers, XUV Lithography and other Applications.
Authors: Shlyaptsev, V. N., Dunn, J., Moon, S. J., Fournier, K. B., Osterheld, A. L., Rocca, J. J., Filevich, J., Marconi, M., Jankowska, E., Hammarsten, E. C., Sakadzic, S., Rahman, A., Frati, M., Tomasel, F. G., Fornaciari, N., Buchenauer, D., Bender, H. A., Karim, S., Kanouff, M.
Source: AIP Conference Proceedings. 2002, Vol. 651 Issue 1, p416. 4p.
Database: Academic Search Ultimate
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DbLabel: Academic Search Ultimate
An: 8687199
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