High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser.

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Bibliographic Details
Title: High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser.
Authors: Bollanti, S., Bonfigli, F., Burattini, E., Di Lazzaro, P., Flora, F., Grilli, A., Letardi, T., Lisi, N., Marinai, A., Mezi, L., Murra, D., Zheng, C.
Source: Applied Physics B: Lasers & Optics. 2003, Vol. 76 Issue 3, p277. 8p.
Database: Academic Search Ultimate
Description
ISSN:09462171
DOI:10.1007/s00340-002-1088-0