The application of response surface and robust design methods to semiconductor process and device simulation

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Bibliographic Details
Title: The application of response surface and robust design methods to semiconductor process and device simulation
Authors: Jones, Kenneth L.
Committee Members: Liou, Juin J.
Summary: This thesis describes the application of response surface methods and robust design methods to the simulation of a CMOS semiconductor process and devices. The problem addressed involves five processing input variables, four process noise variables and four responses. In the use of robust design method, it is shown how a scoring function can be utilized to assist in the selection of an optimum operating point. The robust design application selects an operating point based on centering the.process mean and minimizing the sensitivity of the process to variability in the process. Both methods are shown to provide satisfactory results.
URL: https://stars.library.ucf.edu/rtd/3858
Database: OpenDissertations
Description
Abstract:This thesis describes the application of response surface methods and robust design methods to the simulation of a CMOS semiconductor process and devices. The problem addressed involves five processing input variables, four process noise variables and four responses. In the use of robust design method, it is shown how a scoring function can be utilized to assist in the selection of an optimum operating point. The robust design application selects an operating point based on centering the.process mean and minimizing the sensitivity of the process to variability in the process. Both methods are shown to provide satisfactory results.