Bibliographic Details
| Title: |
High-pressure melt growth and transport properties of SiP, SiAs, GeP, and GeAs 2D layered semiconductors. |
| Authors: |
Barreteau, C.1 Celine.Barreteau@unige.ch, Michon, B.1, Besnard, C.1, Giannini, E.1 |
| Source: |
Journal of Crystal Growth. Jun2016, Vol. 443, p75-80. 6p. |
| Subjects: |
Semiconductors, Maleic acid, Sialic acids, Polycrystalline silicon, Germanium crystals, Single crystals |
| Abstract: |
Silicon and Germanium monopnictides SiP, SiAs, GeP and GeAs form a family of 2D layered semiconductors. We have succeeded in growing bulk single crystals of these compounds by melt-growth under high pressure (0.5-1 GPa) in a cubic anvil hot press. Large (mm-size), shiny, micaceous crystals of GeP, GeAs and SiAs were obtained, and could be exfoliated into 2D flakes. Small and brittle crystals of SiP were yielded by this method. High-pressure sintered polycrystalline SiP and GeAs have also been successfully used as a precursor in the Chemical Vapor Transport growth of these crystals in the presence of I 2 as a transport agent. All compounds are found to crystallize in the expected layered structure and do not undergo any structural transition at low temperature, as shown by Raman spectroscopy down to T=5 K. All materials exhibit a semiconducting behavior. The electrical resistivity of GeP, GeAs and SiAs is found to depend on temperature following a 2D-Variable Range Hopping conduction mechanism. The availability of bulk crystals of these compounds opens new perspectives in the field of 2D semiconducting materials for device applications. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |