Bibliographic Details
| Title: |
Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data. |
| Authors: |
Chen, Xiuguo1, Shi, Yating1, Jiang, Hao1, Zhang, Chuanwei1,2, Liu, Shiyuan1,2 shyliu@hust.edu.cn |
| Source: |
Applied Surface Science. Dec2016 Part A, Vol. 388, p524-530. 7p. |
| Subjects: |
Nondestructive testing, Lithography techniques, Surface roughness, Mueller calculus, Ellipsometry, Scanning electron microscopy |
| Abstract: |
Mueller matrix ellipsometry (MME) is applied to characterize lithographic patterns with natural line edge roughness (LER). A computationally efficient approach based on effective medium approximation is proposed to model the effects of LER in MME measurements. We present both the theoretical and experimental results on lithographic patterns with realistic LER which demonstrate that MME in combination with the proposed effective modeling method is capable of quantifying LER amplitudes. Quantitative comparisons between the MME and scanning electron microscopy measured results also reveal the strong potential of this technique for in-line nondestructive line roughness monitoring. [ABSTRACT FROM AUTHOR] |
|
Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) |
| Database: |
Engineering Source |
