APA (7th ed.) Citation

Chen, X., Shi, Y., Jiang, H., Zhang, C., & Liu, S. (2016). Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data. Applied Surface Science, 388, 524. https://doi.org/10.1016/j.apsusc.2015.10.167

Chicago Style (17th ed.) Citation

Chen, Xiuguo, Yating Shi, Hao Jiang, Chuanwei Zhang, and Shiyuan Liu. "Nondestructive Analysis of Lithographic Patterns with Natural Line Edge Roughness from Mueller Matrix Ellipsometric Data." Applied Surface Science 388 (2016): 524. https://doi.org/10.1016/j.apsusc.2015.10.167.

MLA (9th ed.) Citation

Chen, Xiuguo, et al. "Nondestructive Analysis of Lithographic Patterns with Natural Line Edge Roughness from Mueller Matrix Ellipsometric Data." Applied Surface Science, vol. 388, 2016, p. 524, https://doi.org/10.1016/j.apsusc.2015.10.167.