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Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data.

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Title: Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data.
Authors: Chen, Xiuguo1, Shi, Yating1, Jiang, Hao1, Zhang, Chuanwei1,2, Liu, Shiyuan1,2 shyliu@hust.edu.cn
Source: Applied Surface Science. Dec2016 Part A, Vol. 388, p524-530. 7p.
Subjects: Nondestructive testing, Lithography techniques, Surface roughness, Mueller calculus, Ellipsometry, Scanning electron microscopy
Abstract: Mueller matrix ellipsometry (MME) is applied to characterize lithographic patterns with natural line edge roughness (LER). A computationally efficient approach based on effective medium approximation is proposed to model the effects of LER in MME measurements. We present both the theoretical and experimental results on lithographic patterns with realistic LER which demonstrate that MME in combination with the proposed effective modeling method is capable of quantifying LER amplitudes. Quantitative comparisons between the MME and scanning electron microscopy measured results also reveal the strong potential of this technique for in-line nondestructive line roughness monitoring. [ABSTRACT FROM AUTHOR]
Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 118340814
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PubTypeId: academicJournal
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Chen%2C+Xiuguo%22">Chen, Xiuguo</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Shi%2C+Yating%22">Shi, Yating</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Jiang%2C+Hao%22">Jiang, Hao</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Zhang%2C+Chuanwei%22">Zhang, Chuanwei</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AR" term="%22Liu%2C+Shiyuan%22">Liu, Shiyuan</searchLink><relatesTo>1,2</relatesTo><i> shyliu@hust.edu.cn</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Applied+Surface+Science%22">Applied Surface Science</searchLink>. Dec2016 Part A, Vol. 388, p524-530. 7p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Nondestructive+testing%22">Nondestructive testing</searchLink><br /><searchLink fieldCode="DE" term="%22Lithography+techniques%22">Lithography techniques</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+roughness%22">Surface roughness</searchLink><br /><searchLink fieldCode="DE" term="%22Mueller+calculus%22">Mueller calculus</searchLink><br /><searchLink fieldCode="DE" term="%22Ellipsometry%22">Ellipsometry</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+electron+microscopy%22">Scanning electron microscopy</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Mueller matrix ellipsometry (MME) is applied to characterize lithographic patterns with natural line edge roughness (LER). A computationally efficient approach based on effective medium approximation is proposed to model the effects of LER in MME measurements. We present both the theoretical and experimental results on lithographic patterns with realistic LER which demonstrate that MME in combination with the proposed effective modeling method is capable of quantifying LER amplitudes. Quantitative comparisons between the MME and scanning electron microscopy measured results also reveal the strong potential of this technique for in-line nondestructive line roughness monitoring. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.apsusc.2015.10.167
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 7
        StartPage: 524
    Subjects:
      – SubjectFull: Nondestructive testing
        Type: general
      – SubjectFull: Lithography techniques
        Type: general
      – SubjectFull: Surface roughness
        Type: general
      – SubjectFull: Mueller calculus
        Type: general
      – SubjectFull: Ellipsometry
        Type: general
      – SubjectFull: Scanning electron microscopy
        Type: general
    Titles:
      – TitleFull: Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Chen, Xiuguo
      – PersonEntity:
          Name:
            NameFull: Shi, Yating
      – PersonEntity:
          Name:
            NameFull: Jiang, Hao
      – PersonEntity:
          Name:
            NameFull: Zhang, Chuanwei
      – PersonEntity:
          Name:
            NameFull: Liu, Shiyuan
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 12
              Text: Dec2016 Part A
              Type: published
              Y: 2016
          Identifiers:
            – Type: issn-print
              Value: 01694332
          Numbering:
            – Type: volume
              Value: 388
          Titles:
            – TitleFull: Applied Surface Science
              Type: main
ResultId 1