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Aluminium oxide passivation films by liquid phase deposition for TiO2 ultraviolet solid–liquid heterojunction photodetectors.

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Title: Aluminium oxide passivation films by liquid phase deposition for TiO2 ultraviolet solid–liquid heterojunction photodetectors.
Authors: Huang, Jung-Jie1 (AUTHOR) jjhuang@mail.dyu.edu.tw, Lin, Ching-Huang2 (AUTHOR), Ho, Ying-Rong3 (AUTHOR), Chang, Yu-Han2 (AUTHOR)
Source: Surface & Coatings Technology. Jun2020, Vol. 391, pN.PAG-N.PAG. 1p.
Subjects: Liquid films, Oxide coating, Photodetectors, Heterojunctions, Surface roughness, Aluminum oxide
Abstract: In this study, an aluminum oxide passivation layer generated through liquid-phase deposition (LPD) was used to improve the properties of a TiO 2 ultraviolet solid–liquid heterojunction photodetector. An aluminum oxide deposition solution was used to reduce the oxygen vacancies of TiO 2. Moreover, the surface roughness and porosity of the TiO 2 film improved after aluminum oxide deposition. An aluminum oxide passivation layer was deposited on a TiO 2 /indium-tin-oxide (ITO)/glass photodetector with the precursors of aluminum sulfate and sodium bicarbonate. The responsivity and turn-off time of the TiO 2 /ITO photodetector were 133 mA/W and 34.6 s, respectively. A dense and uniform film surface could be obtained after the aluminum oxide passivation layer was deposited on TiO 2 to form an Al 2 O 3 –TiO 2 composite film. After deposition, the responsivity and turn-off time improved to 208 mA/W and 27.3 s, respectively. Thus, the LPD passivation film is highly favorable for improving the properties of photodetectors. • Aluminium oxide passivation layer was used to improve the properties of TiO 2 ultraviolet photodetector. • The aluminium oxide film was prepared by liquid phase deposition. • Aluminium oxide passivation layer can reduce the oxygen vacancy of TiO 2 film. • The responsivity can be improved to from 133 mA/W to 208 mA/W after the passivation layer treatment. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
Description
Abstract:In this study, an aluminum oxide passivation layer generated through liquid-phase deposition (LPD) was used to improve the properties of a TiO 2 ultraviolet solid–liquid heterojunction photodetector. An aluminum oxide deposition solution was used to reduce the oxygen vacancies of TiO 2. Moreover, the surface roughness and porosity of the TiO 2 film improved after aluminum oxide deposition. An aluminum oxide passivation layer was deposited on a TiO 2 /indium-tin-oxide (ITO)/glass photodetector with the precursors of aluminum sulfate and sodium bicarbonate. The responsivity and turn-off time of the TiO 2 /ITO photodetector were 133 mA/W and 34.6 s, respectively. A dense and uniform film surface could be obtained after the aluminum oxide passivation layer was deposited on TiO 2 to form an Al 2 O 3 –TiO 2 composite film. After deposition, the responsivity and turn-off time improved to 208 mA/W and 27.3 s, respectively. Thus, the LPD passivation film is highly favorable for improving the properties of photodetectors. • Aluminium oxide passivation layer was used to improve the properties of TiO 2 ultraviolet photodetector. • The aluminium oxide film was prepared by liquid phase deposition. • Aluminium oxide passivation layer can reduce the oxygen vacancy of TiO 2 film. • The responsivity can be improved to from 133 mA/W to 208 mA/W after the passivation layer treatment. [ABSTRACT FROM AUTHOR]
ISSN:02578972
DOI:10.1016/j.surfcoat.2020.125684