Purity analysis for room-temperature semiconductor radiation detection material, CsPbBr3, using ICP-MS.

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Title: Purity analysis for room-temperature semiconductor radiation detection material, CsPbBr3, using ICP-MS.
Authors: Makanda, Ulrich1 (AUTHOR), Voinot, Alexandre2,3 (AUTHOR), Kandel, Ramjee1,3 (AUTHOR), Wu, Yu1 (AUTHOR), Leybourne, Matthew2,3 (AUTHOR), Wang, Peng1,3 (AUTHOR) wang.peng@queensu.ca
Source: JAAS (Journal of Analytical Atomic Spectrometry). Nov2020, Vol. 35 Issue 11, p2672-2678. 7p.
Subjects: Inductively coupled plasma mass spectrometry, Semiconductor analysis, Trace analysis, Perovskite analysis
Abstract: An inductively coupled plasma mass spectrometry (ICP-MS) protocol was developed for trace impurity analysis of the halide perovskite semiconductor, CsPbBr3. Method validation was performed by doping solution synthesized CsPbBr3 samples with distinct amounts of a multi-element mixture. The limit of detection (LOD) for the twelve doped elements (Zn, Cr, Ga, Mn, Tl, Bi, As, In, Sn, Ni, Se and Sb) ranged from 0.0004 μg L−1 to 0.377 μg L−1, whereas the limit of quantification (LOQ) ranged from 0.001 μg L−1 to 1.26 μg L−1. Apart from Cr and Se, a linear relationship between doped and detected concentration was observed amongst these elements. The validated ICP-MS process was applied to a high temperature zone-refined CsPbBr3 ingot to study impurity segregation. The total impurity levels (TIL) of the zone-refined samples range from 15.7 ± 1.3 to 54.6 ± 1.2 μg g−1 and depend on the positions of the samples within the ingot. [ABSTRACT FROM AUTHOR]
Copyright of JAAS (Journal of Analytical Atomic Spectrometry) is the property of Royal Society of Chemistry and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Label: Title
  Group: Ti
  Data: Purity analysis for room-temperature semiconductor radiation detection material, CsPbBr<subscript>3</subscript>, using ICP-MS.
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  Data: <searchLink fieldCode="AR" term="%22Makanda%2C+Ulrich%22">Makanda, Ulrich</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Voinot%2C+Alexandre%22">Voinot, Alexandre</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kandel%2C+Ramjee%22">Kandel, Ramjee</searchLink><relatesTo>1,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wu%2C+Yu%22">Wu, Yu</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Leybourne%2C+Matthew%22">Leybourne, Matthew</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wang%2C+Peng%22">Wang, Peng</searchLink><relatesTo>1,3</relatesTo> (AUTHOR)<i> wang.peng@queensu.ca</i>
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  Data: <searchLink fieldCode="JN" term="%22JAAS+%28Journal+of+Analytical+Atomic+Spectrometry%29%22">JAAS (Journal of Analytical Atomic Spectrometry)</searchLink>. Nov2020, Vol. 35 Issue 11, p2672-2678. 7p.
– Name: Subject
  Label: Subjects
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  Data: <searchLink fieldCode="DE" term="%22Inductively+coupled+plasma+mass+spectrometry%22">Inductively coupled plasma mass spectrometry</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+analysis%22">Semiconductor analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Trace+analysis%22">Trace analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Perovskite+analysis%22">Perovskite analysis</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: An inductively coupled plasma mass spectrometry (ICP-MS) protocol was developed for trace impurity analysis of the halide perovskite semiconductor, CsPbBr3. Method validation was performed by doping solution synthesized CsPbBr3 samples with distinct amounts of a multi-element mixture. The limit of detection (LOD) for the twelve doped elements (Zn, Cr, Ga, Mn, Tl, Bi, As, In, Sn, Ni, Se and Sb) ranged from 0.0004 μg L−1 to 0.377 μg L−1, whereas the limit of quantification (LOQ) ranged from 0.001 μg L−1 to 1.26 μg L−1. Apart from Cr and Se, a linear relationship between doped and detected concentration was observed amongst these elements. The validated ICP-MS process was applied to a high temperature zone-refined CsPbBr3 ingot to study impurity segregation. The total impurity levels (TIL) of the zone-refined samples range from 15.7 ± 1.3 to 54.6 ± 1.2 μg g−1 and depend on the positions of the samples within the ingot. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of JAAS (Journal of Analytical Atomic Spectrometry) is the property of Royal Society of Chemistry and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1039/d0ja00223b
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      – Code: eng
        Text: English
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        PageCount: 7
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      – SubjectFull: Inductively coupled plasma mass spectrometry
        Type: general
      – SubjectFull: Semiconductor analysis
        Type: general
      – SubjectFull: Trace analysis
        Type: general
      – SubjectFull: Perovskite analysis
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      – TitleFull: Purity analysis for room-temperature semiconductor radiation detection material, CsPbBr3, using ICP-MS.
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            NameFull: Makanda, Ulrich
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            NameFull: Voinot, Alexandre
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            NameFull: Wu, Yu
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              M: 11
              Text: Nov2020
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              Y: 2020
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