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Cuprous Oxide Films Deposition by Mid-Frequency Magnetron Sputtering and Their Photocatalytic Activity under Visible Light.

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Title: Cuprous Oxide Films Deposition by Mid-Frequency Magnetron Sputtering and Their Photocatalytic Activity under Visible Light.
Authors: Mu, Z. X.1 (AUTHOR) muz@dlut.edu.cn, Li, H.1 (AUTHOR) 594089256@qq.com, Deng, X. N.1 (AUTHOR) dengxn88@168.com
Source: NANO (1793-2920). Nov2021, Vol. 16 Issue 11, p1-13. 13p.
Subjects: Photocatalysts, Magnetron sputtering, Cuprous oxide, Oxide coating, Visible spectra, Copper oxide films
Abstract: Cuprous oxide (Cu2O) has attracted much attention as a photocatalytic material. In this paper, the mid-frequency reactive magnetron sputtering method was used to prepare Cu2O films on glass slides, and the effects of oxygen flow and deposition time on the structures, morphologies and photocatalytic properties of the films were studied. The results show that the films prepared by this method have smooth surfaces and good absorptivity in the visible region. As the oxygen flow increases, the films transit from the mixed-phase of Cu and Cu2O to the single-phase of Cu2O. When the oxygen flow continues to increase, the films change to a mixed-phase of Cu4O3 and Cu2O. The photocatalytic decolorization of methyl orange under visible light irradiation conditions was used to assess the photocatalytic properties of the prepared films. When the oxygen flow is 6 sccm and the deposition time is 15 min, the film exhibits the best photocatalytic activity. Finally, the Mulliken electronegativity theory was used to explain the photocatalytic mechanism of Cu2O. This study confirmed the feasibility of preparing Cu2O photocatalytic films by magnetron sputtering, and provided the experimental basis for the subsequent study of Cu2O photocatalytic films. The deposition parameters of the mid-frequency reactive magnetron sputtering method affect the crystal structure and morphology of copper oxide films. The oxygen flow can control the composition of the films from the mixed-phase structure to the single-phase structure. In this work, the optimal deposition conditions were determined to prepare nano-Cu2O films. [ABSTRACT FROM AUTHOR]
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Abstract:Cuprous oxide (Cu2O) has attracted much attention as a photocatalytic material. In this paper, the mid-frequency reactive magnetron sputtering method was used to prepare Cu2O films on glass slides, and the effects of oxygen flow and deposition time on the structures, morphologies and photocatalytic properties of the films were studied. The results show that the films prepared by this method have smooth surfaces and good absorptivity in the visible region. As the oxygen flow increases, the films transit from the mixed-phase of Cu and Cu2O to the single-phase of Cu2O. When the oxygen flow continues to increase, the films change to a mixed-phase of Cu4O3 and Cu2O. The photocatalytic decolorization of methyl orange under visible light irradiation conditions was used to assess the photocatalytic properties of the prepared films. When the oxygen flow is 6 sccm and the deposition time is 15 min, the film exhibits the best photocatalytic activity. Finally, the Mulliken electronegativity theory was used to explain the photocatalytic mechanism of Cu2O. This study confirmed the feasibility of preparing Cu2O photocatalytic films by magnetron sputtering, and provided the experimental basis for the subsequent study of Cu2O photocatalytic films. The deposition parameters of the mid-frequency reactive magnetron sputtering method affect the crystal structure and morphology of copper oxide films. The oxygen flow can control the composition of the films from the mixed-phase structure to the single-phase structure. In this work, the optimal deposition conditions were determined to prepare nano-Cu2O films. [ABSTRACT FROM AUTHOR]
ISSN:17932920
DOI:10.1142/S1793292021501290