Effect of Periodic Modulation of Tungsten Oxide Magnetron Deposition Angle upon the Obtained Layer Structure according to X-Ray Reflectometry Measurements.
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| Title: | Effect of Periodic Modulation of Tungsten Oxide Magnetron Deposition Angle upon the Obtained Layer Structure according to X-Ray Reflectometry Measurements. |
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| Authors: | Matveev, V. A.1 (AUTHOR), Eruzin, A. A.2 (AUTHOR), Semenova, A. A.3 (AUTHOR), Mjakin, S. V.3,4 (AUTHOR) svmjakin@technolog.edu.ru, Katashev, P. A.3 (AUTHOR) |
| Source: | Glass Physics & Chemistry. Dec2021 Supplement, Vol. 47 Issue 1, pS63-S66. 4p. |
| Subjects: | X-ray reflectometry, Tungsten oxides, Magnetron sputtering, Electrochromic effect, Electrochromic devices, Magnetrons, Electron density |
| Abstract: | X-ray reflectometry characterization of tungsten oxide nanolayers deposited onto glass supports via magnetron sputtering in a stationary mode and using the rotating support revealed that non-stationary deposition mode involving the support rotation provides coatings with a complex structure featuring with a periodic electron density modulation in depth that is promising for the adjustment of the target performances. Particularly, the application of this approach provided a significant increase of the electrochromic efficiency and coloration/bleaching rate for electrochromic devices in comparison with counterparts obtained by tungsten oxide layer deposition onto a stationary support. [ABSTRACT FROM AUTHOR] |
| Copyright of Glass Physics & Chemistry is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Header | DbId: egs DbLabel: Engineering Source An: 155955619 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Effect of Periodic Modulation of Tungsten Oxide Magnetron Deposition Angle upon the Obtained Layer Structure according to X-Ray Reflectometry Measurements. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Matveev%2C+V%2E+A%2E%22">Matveev, V. A.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Eruzin%2C+A%2E+A%2E%22">Eruzin, A. A.</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Semenova%2C+A%2E+A%2E%22">Semenova, A. A.</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mjakin%2C+S%2E+V%2E%22">Mjakin, S. V.</searchLink><relatesTo>3,4</relatesTo> (AUTHOR)<i> svmjakin@technolog.edu.ru</i><br /><searchLink fieldCode="AR" term="%22Katashev%2C+P%2E+A%2E%22">Katashev, P. A.</searchLink><relatesTo>3</relatesTo> (AUTHOR) – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Glass+Physics+%26+Chemistry%22">Glass Physics & Chemistry</searchLink>. Dec2021 Supplement, Vol. 47 Issue 1, pS63-S66. 4p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22X-ray+reflectometry%22">X-ray reflectometry</searchLink><br /><searchLink fieldCode="DE" term="%22Tungsten+oxides%22">Tungsten oxides</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Electrochromic+effect%22">Electrochromic effect</searchLink><br /><searchLink fieldCode="DE" term="%22Electrochromic+devices%22">Electrochromic devices</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetrons%22">Magnetrons</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+density%22">Electron density</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: X-ray reflectometry characterization of tungsten oxide nanolayers deposited onto glass supports via magnetron sputtering in a stationary mode and using the rotating support revealed that non-stationary deposition mode involving the support rotation provides coatings with a complex structure featuring with a periodic electron density modulation in depth that is promising for the adjustment of the target performances. Particularly, the application of this approach provided a significant increase of the electrochromic efficiency and coloration/bleaching rate for electrochromic devices in comparison with counterparts obtained by tungsten oxide layer deposition onto a stationary support. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Glass Physics & Chemistry is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1134/S1087659621070075 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 4 StartPage: S63 Subjects: – SubjectFull: X-ray reflectometry Type: general – SubjectFull: Tungsten oxides Type: general – SubjectFull: Magnetron sputtering Type: general – SubjectFull: Electrochromic effect Type: general – SubjectFull: Electrochromic devices Type: general – SubjectFull: Magnetrons Type: general – SubjectFull: Electron density Type: general Titles: – TitleFull: Effect of Periodic Modulation of Tungsten Oxide Magnetron Deposition Angle upon the Obtained Layer Structure according to X-Ray Reflectometry Measurements. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Matveev, V. A. – PersonEntity: Name: NameFull: Eruzin, A. A. – PersonEntity: Name: NameFull: Semenova, A. A. – PersonEntity: Name: NameFull: Mjakin, S. V. – PersonEntity: Name: NameFull: Katashev, P. A. IsPartOfRelationships: – BibEntity: Dates: – D: 02 M: 12 Text: Dec2021 Supplement Type: published Y: 2021 Identifiers: – Type: issn-print Value: 10876596 Numbering: – Type: volume Value: 47 – Type: issue Value: 1 Titles: – TitleFull: Glass Physics & Chemistry Type: main |
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