APA (7th ed.) Citation

Yang, J., Wu, Z., Duan, Z., Li, C., Zhou, H., Wang, T., . . . Leung, C. M. (2022). Micron-thick ternary relaxor 0.36Pb(In1/2Nb1/2)O3–0.36Pb(Mg1/3Nb2/3)O3–0.28PbTiO3 thin films with superior pyroelectric response on Si substrate. Applied Physics A: Materials Science & Processing, 128(6), 1. https://doi.org/10.1007/s00339-022-05668-w

Chicago Style (17th ed.) Citation

Yang, Jiaqian, et al. "Micron-thick Ternary Relaxor 0.36Pb(In1/2Nb1/2)O3–0.36Pb(Mg1/3Nb2/3)O3–0.28PbTiO3 Thin Films with Superior Pyroelectric Response on Si Substrate." Applied Physics A: Materials Science & Processing 128, no. 6 (2022): 1. https://doi.org/10.1007/s00339-022-05668-w.

MLA (9th ed.) Citation

Yang, Jiaqian, et al. "Micron-thick Ternary Relaxor 0.36Pb(In1/2Nb1/2)O3–0.36Pb(Mg1/3Nb2/3)O3–0.28PbTiO3 Thin Films with Superior Pyroelectric Response on Si Substrate." Applied Physics A: Materials Science & Processing, vol. 128, no. 6, 2022, p. 1, https://doi.org/10.1007/s00339-022-05668-w.