High-Resolution Laser Interference Ablation and Amorphization of Silicon.
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| Title: | High-Resolution Laser Interference Ablation and Amorphization of Silicon. |
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| Authors: | Blumenstein, Andreas1 (AUTHOR), Simon, Peter1 (AUTHOR), Ihlemann, Jürgen1 (AUTHOR) juergen.ihlemann@ifnano.de |
| Source: | Nanomaterials (2079-4991). Aug2023, Vol. 13 Issue 15, p2240. 10p. |
| Subjects: | Laser ablation, Amorphization, Femtosecond pulses, Silicon surfaces, Surface structure, Femtosecond lasers |
| Abstract: | The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano13152240 |
