High-Resolution Laser Interference Ablation and Amorphization of Silicon.

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Title: High-Resolution Laser Interference Ablation and Amorphization of Silicon.
Authors: Blumenstein, Andreas1 (AUTHOR), Simon, Peter1 (AUTHOR), Ihlemann, Jürgen1 (AUTHOR) juergen.ihlemann@ifnano.de
Source: Nanomaterials (2079-4991). Aug2023, Vol. 13 Issue 15, p2240. 10p.
Subjects: Laser ablation, Amorphization, Femtosecond pulses, Silicon surfaces, Surface structure, Femtosecond lasers
Abstract: The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 169909402
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  Label: Title
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  Data: High-Resolution Laser Interference Ablation and Amorphization of Silicon.
– Name: Author
  Label: Authors
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  Data: <searchLink fieldCode="AR" term="%22Blumenstein%2C+Andreas%22">Blumenstein, Andreas</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Simon%2C+Peter%22">Simon, Peter</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ihlemann%2C+Jürgen%22">Ihlemann, Jürgen</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> juergen.ihlemann@ifnano.de</i>
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  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Aug2023, Vol. 13 Issue 15, p2240. 10p.
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  Data: <searchLink fieldCode="DE" term="%22Laser+ablation%22">Laser ablation</searchLink><br /><searchLink fieldCode="DE" term="%22Amorphization%22">Amorphization</searchLink><br /><searchLink fieldCode="DE" term="%22Femtosecond+pulses%22">Femtosecond pulses</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+surfaces%22">Silicon surfaces</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+structure%22">Surface structure</searchLink><br /><searchLink fieldCode="DE" term="%22Femtosecond+lasers%22">Femtosecond lasers</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.3390/nano13152240
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 2240
    Subjects:
      – SubjectFull: Laser ablation
        Type: general
      – SubjectFull: Amorphization
        Type: general
      – SubjectFull: Femtosecond pulses
        Type: general
      – SubjectFull: Silicon surfaces
        Type: general
      – SubjectFull: Surface structure
        Type: general
      – SubjectFull: Femtosecond lasers
        Type: general
    Titles:
      – TitleFull: High-Resolution Laser Interference Ablation and Amorphization of Silicon.
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            NameFull: Blumenstein, Andreas
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            NameFull: Simon, Peter
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            NameFull: Ihlemann, Jürgen
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            – D: 01
              M: 08
              Text: Aug2023
              Type: published
              Y: 2023
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              Value: 13
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              Value: 15
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            – TitleFull: Nanomaterials (2079-4991)
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