High-Resolution Laser Interference Ablation and Amorphization of Silicon.
Saved in:
| Title: | High-Resolution Laser Interference Ablation and Amorphization of Silicon. |
|---|---|
| Authors: | Blumenstein, Andreas1 (AUTHOR), Simon, Peter1 (AUTHOR), Ihlemann, Jürgen1 (AUTHOR) juergen.ihlemann@ifnano.de |
| Source: | Nanomaterials (2079-4991). Aug2023, Vol. 13 Issue 15, p2240. 10p. |
| Subjects: | Laser ablation, Amorphization, Femtosecond pulses, Silicon surfaces, Surface structure, Femtosecond lasers |
| Abstract: | The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
|
Full text is not displayed to guests.
Login for full access.
|
|
| FullText | Links: – Type: pdflink Text: Availability: 1 |
|---|---|
| Header | DbId: egs DbLabel: Engineering Source An: 169909402 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: High-Resolution Laser Interference Ablation and Amorphization of Silicon. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Blumenstein%2C+Andreas%22">Blumenstein, Andreas</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Simon%2C+Peter%22">Simon, Peter</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ihlemann%2C+Jürgen%22">Ihlemann, Jürgen</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> juergen.ihlemann@ifnano.de</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Aug2023, Vol. 13 Issue 15, p2240. 10p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Laser+ablation%22">Laser ablation</searchLink><br /><searchLink fieldCode="DE" term="%22Amorphization%22">Amorphization</searchLink><br /><searchLink fieldCode="DE" term="%22Femtosecond+pulses%22">Femtosecond pulses</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+surfaces%22">Silicon surfaces</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+structure%22">Surface structure</searchLink><br /><searchLink fieldCode="DE" term="%22Femtosecond+lasers%22">Femtosecond lasers</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=169909402 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/nano13152240 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 10 StartPage: 2240 Subjects: – SubjectFull: Laser ablation Type: general – SubjectFull: Amorphization Type: general – SubjectFull: Femtosecond pulses Type: general – SubjectFull: Silicon surfaces Type: general – SubjectFull: Surface structure Type: general – SubjectFull: Femtosecond lasers Type: general Titles: – TitleFull: High-Resolution Laser Interference Ablation and Amorphization of Silicon. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Blumenstein, Andreas – PersonEntity: Name: NameFull: Simon, Peter – PersonEntity: Name: NameFull: Ihlemann, Jürgen IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 08 Text: Aug2023 Type: published Y: 2023 Identifiers: – Type: issn-print Value: 20794991 Numbering: – Type: volume Value: 13 – Type: issue Value: 15 Titles: – TitleFull: Nanomaterials (2079-4991) Type: main |
| ResultId | 1 |