Microstructural and chemical effects of the argon cluster bombardment on a single crystal KGd(WO4)2 surface.

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Title: Microstructural and chemical effects of the argon cluster bombardment on a single crystal KGd(WO4)2 surface.
Authors: Korobeishchikov, Nikolay G.1 (AUTHOR), Nikolaev, Ivan V.1 (AUTHOR), Atuchin, Victor V.2,3,4,5,6 (AUTHOR) atuchin@isp.nsc.ru, Gerasimov, Evgeny Y.7 (AUTHOR), Tolstoguzov, Alexander8,9,10 (AUTHOR), Abudouwufu, Tushagu11 (AUTHOR), Fu, Dejun11 (AUTHOR)
Source: Applied Physics A: Materials Science & Processing. Nov2024, Vol. 130 Issue 11, p1-9. 9p.
Subjects: Optical materials, Complex ions, Depth profiling, Transmission electron microscopy, Crystal surfaces
Abstract: To elucidate the influence of gas cluster-induced impacts on the deep structure of disturbances in tungstate optical materials, experimental studies were carried out. The precision-polished surface of a KGd(WO4)2 (KGW) single crystal was processed by an argon cluster ion beam with the average cluster size of 1000 atom/cluster at the energy of 10 keV, which ensures minimal damage and high processing efficiency. By using high-resolution TEM and EDX techniques of the transversely cut lamellae, the alterations in both the structure and chemical composition at varying depths were explore. In a 15 nm thick subsurface layer of the initial specimen, a nonuniform depth distribution was found for the constituent atoms of KGW. The results showed that, after the cluster bombardment, the initial amorphous layer thickness resulting from precision chemical–mechanical polishing was decreased from 50 to 23 nm. The distribution nonuniformity of constituent KGW atoms decreases in the upper subsurface layer, while it increases at greater depths. [ABSTRACT FROM AUTHOR]
Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Microstructural and chemical effects of the argon cluster bombardment on a single crystal KGd(WO<subscript>4</subscript>)<subscript>2</subscript> surface.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Korobeishchikov%2C+Nikolay+G%2E%22">Korobeishchikov, Nikolay G.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Nikolaev%2C+Ivan+V%2E%22">Nikolaev, Ivan V.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Atuchin%2C+Victor+V%2E%22">Atuchin, Victor V.</searchLink><relatesTo>2,3,4,5,6</relatesTo> (AUTHOR)<i> atuchin@isp.nsc.ru</i><br /><searchLink fieldCode="AR" term="%22Gerasimov%2C+Evgeny+Y%2E%22">Gerasimov, Evgeny Y.</searchLink><relatesTo>7</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Tolstoguzov%2C+Alexander%22">Tolstoguzov, Alexander</searchLink><relatesTo>8,9,10</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Abudouwufu%2C+Tushagu%22">Abudouwufu, Tushagu</searchLink><relatesTo>11</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Fu%2C+Dejun%22">Fu, Dejun</searchLink><relatesTo>11</relatesTo> (AUTHOR)
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. Nov2024, Vol. 130 Issue 11, p1-9. 9p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Optical+materials%22">Optical materials</searchLink><br /><searchLink fieldCode="DE" term="%22Complex+ions%22">Complex ions</searchLink><br /><searchLink fieldCode="DE" term="%22Depth+profiling%22">Depth profiling</searchLink><br /><searchLink fieldCode="DE" term="%22Transmission+electron+microscopy%22">Transmission electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+surfaces%22">Crystal surfaces</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: To elucidate the influence of gas cluster-induced impacts on the deep structure of disturbances in tungstate optical materials, experimental studies were carried out. The precision-polished surface of a KGd(WO4)2 (KGW) single crystal was processed by an argon cluster ion beam with the average cluster size of 1000 atom/cluster at the energy of 10 keV, which ensures minimal damage and high processing efficiency. By using high-resolution TEM and EDX techniques of the transversely cut lamellae, the alterations in both the structure and chemical composition at varying depths were explore. In a 15 nm thick subsurface layer of the initial specimen, a nonuniform depth distribution was found for the constituent atoms of KGW. The results showed that, after the cluster bombardment, the initial amorphous layer thickness resulting from precision chemical–mechanical polishing was decreased from 50 to 23 nm. The distribution nonuniformity of constituent KGW atoms decreases in the upper subsurface layer, while it increases at greater depths. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1007/s00339-024-07995-6
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 9
        StartPage: 1
    Subjects:
      – SubjectFull: Optical materials
        Type: general
      – SubjectFull: Complex ions
        Type: general
      – SubjectFull: Depth profiling
        Type: general
      – SubjectFull: Transmission electron microscopy
        Type: general
      – SubjectFull: Crystal surfaces
        Type: general
    Titles:
      – TitleFull: Microstructural and chemical effects of the argon cluster bombardment on a single crystal KGd(WO4)2 surface.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Korobeishchikov, Nikolay G.
      – PersonEntity:
          Name:
            NameFull: Nikolaev, Ivan V.
      – PersonEntity:
          Name:
            NameFull: Atuchin, Victor V.
      – PersonEntity:
          Name:
            NameFull: Gerasimov, Evgeny Y.
      – PersonEntity:
          Name:
            NameFull: Tolstoguzov, Alexander
      – PersonEntity:
          Name:
            NameFull: Abudouwufu, Tushagu
      – PersonEntity:
          Name:
            NameFull: Fu, Dejun
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 11
              Text: Nov2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 09478396
          Numbering:
            – Type: volume
              Value: 130
            – Type: issue
              Value: 11
          Titles:
            – TitleFull: Applied Physics A: Materials Science & Processing
              Type: main
ResultId 1