APA (7th ed.) Citation

Lin, F., Wu, T., Wang, W., Wang, Z., Zhang, Y., Li, S., . . . Sun, W. (2025). Demonstration of Integrated Quasi-Vertical DMOS Compatible with the Bipolar-CMOS-DMOS Process Achieving Ultralow R ON,sp. Nanomaterials (2079-4991), 15(3), 172. https://doi.org/10.3390/nano15030172

Chicago Style (17th ed.) Citation

Lin, Feng, et al. "Demonstration of Integrated Quasi-Vertical DMOS Compatible with the Bipolar-CMOS-DMOS Process Achieving Ultralow R ON,sp." Nanomaterials (2079-4991) 15, no. 3 (2025): 172. https://doi.org/10.3390/nano15030172.

MLA (9th ed.) Citation

Lin, Feng, et al. "Demonstration of Integrated Quasi-Vertical DMOS Compatible with the Bipolar-CMOS-DMOS Process Achieving Ultralow R ON,sp." Nanomaterials (2079-4991), vol. 15, no. 3, 2025, p. 172, https://doi.org/10.3390/nano15030172.