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Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.

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Title: Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.
Authors: Assfour, Bassem1 (AUTHOR) bassfour@aec.org.sy, Abdallah, Bassam2 (AUTHOR), Allaf, Abdul Wahab1 (AUTHOR), Kakhia, Mahmoud2 (AUTHOR)
Source: Inorganic Chemistry Communications. Jun2025, Vol. 176, pN.PAG-N.PAG. 1p.
Subjects: Nickel-chromium alloys, DC sputtering, Silicon steel, Contact angle, Thin film deposition
Abstract: [Display omitted] • Ni–Cr–Mo films deposited on steel and silicon using DC sputtering. • Higher power increases Cr and Mo in films. • More Cr and Mo enhances hydrophobicity and corrosion resistance. • Films are suitable for dental implants. Our study uniquely explores the function of DC magnetron sputtering power in enhancing the deposition of Ni–Cr–Mo thin films for dental implant applications. Films deposited on 304 stainless steel and silicon substrates (70–100 W) exhibited power-dependent structural and compositional changes, directly linked to enhanced performance. Increasing sputtering power to 100 W elevated Cr/Mo content by ∼10 % and reduced corrosion rate by 40 % compared to 70 W, while contact angles surpassed 98°, achieving hydrophobicity. These improvements stem from denser morphologies and preferential deposition of passivating elements (Cr/Mo), as confirmed by XRD and SEM-EDX. In contrast to previous studies concerning mainly bulk alloy properties, this study establishes a direct process-property relationship for thin film coatings enabling precise control for corrosion resistance and surface wettability as key players to improve implant longevity in biological settings. Therefore, by establishing the correlation between sputtering parameters and electrochemical stability, the present study enhances the design of durable, bioinert coatings, thereby providing a scalable strategy to optimize dental implant materials. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
Description
Abstract:[Display omitted] • Ni–Cr–Mo films deposited on steel and silicon using DC sputtering. • Higher power increases Cr and Mo in films. • More Cr and Mo enhances hydrophobicity and corrosion resistance. • Films are suitable for dental implants. Our study uniquely explores the function of DC magnetron sputtering power in enhancing the deposition of Ni–Cr–Mo thin films for dental implant applications. Films deposited on 304 stainless steel and silicon substrates (70–100 W) exhibited power-dependent structural and compositional changes, directly linked to enhanced performance. Increasing sputtering power to 100 W elevated Cr/Mo content by ∼10 % and reduced corrosion rate by 40 % compared to 70 W, while contact angles surpassed 98°, achieving hydrophobicity. These improvements stem from denser morphologies and preferential deposition of passivating elements (Cr/Mo), as confirmed by XRD and SEM-EDX. In contrast to previous studies concerning mainly bulk alloy properties, this study establishes a direct process-property relationship for thin film coatings enabling precise control for corrosion resistance and surface wettability as key players to improve implant longevity in biological settings. Therefore, by establishing the correlation between sputtering parameters and electrochemical stability, the present study enhances the design of durable, bioinert coatings, thereby providing a scalable strategy to optimize dental implant materials. [ABSTRACT FROM AUTHOR]
ISSN:13877003
DOI:10.1016/j.inoche.2025.114304