Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.
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| Title: | Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering. |
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| Authors: | Tsai, Du-Cheng1 (AUTHOR), Huang, Rong-Hsin2 (AUTHOR), Chang, Zue-Chin3 (AUTHOR) chang@ncut.edu.tw, Chen, Erh-Chiang1,4 (AUTHOR), Huang, Yen-Lin1,4 (AUTHOR), Shieu, Fuh-Sheng1,2 (AUTHOR) |
| Source: | Materials (1996-1944). Apr2025, Vol. 18 Issue 7, p1671. 19p. |
| Subjects: | Substrates (Materials science), Reactive sputtering, Magnetron sputtering, Radio frequency, Grain refinement |
| Abstract: | AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited a single wurtzite-type hexagonal close-packed (hcp) structure. At a 0 V substrate bias, the AlCrN coating consisted of porous V-shaped columnar crystallites, while the AlCrSiN coating exhibited a porous, fiber-like amorphous structure. As the substrate bias increased, crystal growth was promoted, void density decreased, and the surface morphology transitioned from a textured to a more rounded appearance. Additionally, the preferred orientation shifted toward the (101) direction. However, at excessively high substrate bias, re-nucleation occurred, leading to grain refinement and increased film densification, which in turn caused a further shift in the preferred orientation toward the (002) plane. Due to its multi-element composition and the low solubility of Si in nitrides, AlCrSiN coatings tend to exhibit an amorphous growth tendency during sputtering. As a result, their microstructure is more sensitive to substrate bias. This sensitivity results in the formation of a highly dense structure with an optimal crystallite size at a substrate bias of 100 V, leading to a hardness of 22.6 GPa—surpassing that of the AlCrN coating. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited a single wurtzite-type hexagonal close-packed (hcp) structure. At a 0 V substrate bias, the AlCrN coating consisted of porous V-shaped columnar crystallites, while the AlCrSiN coating exhibited a porous, fiber-like amorphous structure. As the substrate bias increased, crystal growth was promoted, void density decreased, and the surface morphology transitioned from a textured to a more rounded appearance. Additionally, the preferred orientation shifted toward the (101) direction. However, at excessively high substrate bias, re-nucleation occurred, leading to grain refinement and increased film densification, which in turn caused a further shift in the preferred orientation toward the (002) plane. Due to its multi-element composition and the low solubility of Si in nitrides, AlCrSiN coatings tend to exhibit an amorphous growth tendency during sputtering. As a result, their microstructure is more sensitive to substrate bias. This sensitivity results in the formation of a highly dense structure with an optimal crystallite size at a substrate bias of 100 V, leading to a hardness of 22.6 GPa—surpassing that of the AlCrN coating. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 19961944 |
| DOI: | 10.3390/ma18071671 |
