Bibliographic Details
| Title: |
Ion deposition on silica surfaces by spin-drying: Characterization of dried layer thickness and ion deposition. |
| Authors: |
Noel, P.1 (AUTHOR) paul.noel@cea.fr, Larrey, V.1 (AUTHOR), Truffier-Boutry, D.1 (AUTHOR), Lardin, T.1 (AUTHOR), Fournel, F.1 (AUTHOR), Rieutord, F.2 (AUTHOR) |
| Source: |
Applied Surface Science. Aug2025, Vol. 699, pN.PAG-N.PAG. 1p. |
| Subjects: |
Silicon surfaces, Optical films, X-ray fluorescence, Ionic solutions, Surface analysis |
| Abstract: |
[Display omitted] The deposition of ions or molecules on silicon dioxide surfaces may have interesting applications fields. The deposition by the spin-drying of active ions on silicon dioxide surfaces is studied to understand the mechanisms involved in ion deposition. The dried thickness is calculated with optical thin film interferences and the amount of ions deposited by Total X-Ray Fluorescence. The contributions of ion adsorption, diffuse layer and bulk solution are investigated. These phenomena may occur in many systems which involve the drying of thin ionic solution layer on silicon dioxide surfaces. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |
