Ion deposition on silica surfaces by spin-drying: Characterization of dried layer thickness and ion deposition.

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Title: Ion deposition on silica surfaces by spin-drying: Characterization of dried layer thickness and ion deposition.
Authors: Noel, P.1 (AUTHOR) paul.noel@cea.fr, Larrey, V.1 (AUTHOR), Truffier-Boutry, D.1 (AUTHOR), Lardin, T.1 (AUTHOR), Fournel, F.1 (AUTHOR), Rieutord, F.2 (AUTHOR)
Source: Applied Surface Science. Aug2025, Vol. 699, pN.PAG-N.PAG. 1p.
Subjects: Silicon surfaces, Optical films, X-ray fluorescence, Ionic solutions, Surface analysis
Abstract: [Display omitted] The deposition of ions or molecules on silicon dioxide surfaces may have interesting applications fields. The deposition by the spin-drying of active ions on silicon dioxide surfaces is studied to understand the mechanisms involved in ion deposition. The dried thickness is calculated with optical thin film interferences and the amount of ions deposited by Total X-Ray Fluorescence. The contributions of ion adsorption, diffuse layer and bulk solution are investigated. These phenomena may occur in many systems which involve the drying of thin ionic solution layer on silicon dioxide surfaces. [ABSTRACT FROM AUTHOR]
Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 184521503
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  Data: Ion deposition on silica surfaces by spin-drying: Characterization of dried layer thickness and ion deposition.
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  Data: <searchLink fieldCode="AR" term="%22Noel%2C+P%2E%22">Noel, P.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> paul.noel@cea.fr</i><br /><searchLink fieldCode="AR" term="%22Larrey%2C+V%2E%22">Larrey, V.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Truffier-Boutry%2C+D%2E%22">Truffier-Boutry, D.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Lardin%2C+T%2E%22">Lardin, T.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Fournel%2C+F%2E%22">Fournel, F.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Rieutord%2C+F%2E%22">Rieutord, F.</searchLink><relatesTo>2</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Applied+Surface+Science%22">Applied Surface Science</searchLink>. Aug2025, Vol. 699, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Silicon+surfaces%22">Silicon surfaces</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+films%22">Optical films</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+fluorescence%22">X-ray fluorescence</searchLink><br /><searchLink fieldCode="DE" term="%22Ionic+solutions%22">Ionic solutions</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+analysis%22">Surface analysis</searchLink>
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  Data: [Display omitted] The deposition of ions or molecules on silicon dioxide surfaces may have interesting applications fields. The deposition by the spin-drying of active ions on silicon dioxide surfaces is studied to understand the mechanisms involved in ion deposition. The dried thickness is calculated with optical thin film interferences and the amount of ions deposited by Total X-Ray Fluorescence. The contributions of ion adsorption, diffuse layer and bulk solution are investigated. These phenomena may occur in many systems which involve the drying of thin ionic solution layer on silicon dioxide surfaces. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1016/j.apsusc.2025.163095
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      – Code: eng
        Text: English
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      – SubjectFull: Silicon surfaces
        Type: general
      – SubjectFull: Optical films
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      – SubjectFull: X-ray fluorescence
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      – SubjectFull: Ionic solutions
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      – SubjectFull: Surface analysis
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              M: 08
              Text: Aug2025
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              Y: 2025
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