APA (7th ed.) Citation

Talneau, A., Chan, M., Laourine, F., Maillard, F., Welinski, S., Berger, P., & Ferrier, A. (2025). High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 43(4), 1. https://doi.org/10.1116/6.0004314

Chicago Style (17th ed.) Citation

Talneau, A., M. Chan, F. Laourine, F. Maillard, S. Welinski, P. Berger, and A. Ferrier. "High Surface Quality Y2SiO5 Silicate-crystal Waveguides Etched by Chlorine-based Inductive Coupled Plasma Reactive Ion Etching." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 43, no. 4 (2025): 1. https://doi.org/10.1116/6.0004314.

MLA (9th ed.) Citation

Talneau, A., et al. "High Surface Quality Y2SiO5 Silicate-crystal Waveguides Etched by Chlorine-based Inductive Coupled Plasma Reactive Ion Etching." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 43, no. 4, 2025, p. 1, https://doi.org/10.1116/6.0004314.